Puolijohdeteknikka II (E0133), 5 op

Basic information

Course name:	Puolijohdeteknikka II Semiconductor Technology II
Course Winha code:	E0133
Kurre acronym:	Pj.tekn.2
Credits:	5
Type and level of course:	Professional studies
Year of study, semester or study period:	3.year, 4.year
Implementation:	3.period, 4.period
Semester:	0607
Language of tuition:	Suomi
Teacher:	Kari Salmi
Final assessment:	Grading scale (0-5)

Descriptions

Prerequisites

E0132 Semiconductor technology 1

Course contents (core content level)

Principles of manufacturing integarted circuits: thermal oxidation, Deal-Grove model for thermal oxidation, photolithography (different techniques, wavelenghts, optical limitations), diffusion, ion implantation (dose, junction depth), etching, CVD processes: LTO and epitaxy, sheet resistance.

Course contents (additional)

Other oxidation models than Deal-Grove, x-ray lithography, electron beam lithography, other CVD films, metallization.

Core content level learning outcomes (knowledge and understanding)

Students learn typical process steps needed in processing semiconductors in microelectronics. Students understand the meaning of each step in manufacturing process.

Core content level learning outcomes (skills)

Students can calculate oxidation times and oxide thicknesses, junction depths and doses in ion implantation and etch rates in etching process. Students can theoretically estimate the optical capability of a lithographic system.

Teaching and learning strategies

Class room teaching: 56 h
Laboratory exercises: - h
Project: 15 h
Exam: 3 h
Student individual workload (student workload analysis carried out 5/05): 56 h
Total: 130 h
Follow-up of the student workload analysis performed: -

Teaching methods and student workload

Assessment weighting and grading

Final exam or compulsory homework. Grade is determined by final exam or homework (which one is better).

Related competences of the degree programme

Semiconductor and Sensor Technology
Theoretical basis and mathematical and science skills